Intellectual property law in China

Bibliographic Details
Main Author: Ganea, Peter
Other Authors: Friedmann, Danny, Lee, Jyh-An, Clark, Douglas (Lawyer), Heath, Christopher
Format: eBook
Language:English
Published: [Alphen aan den Rijn, The Netherlands] Kluwer Law International, 2021.
Edition:Second edition.
Series:Max Planck series on Asian intellectual property law.
Subjects:
Online Access:EBSCOhost
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245 1 0 |a Intellectual property law in China  |c by Peter Ganea, Danny Friedmann, Jyh-An Lee, Douglas Clark ; edited by Christopher Heath. 
250 |a Second edition. 
264 1 |a [Alphen aan den Rijn, The Netherlands]  |b Kluwer Law International,  |c 2021. 
300 |a 1 online resource (xxi, 528 pages) 
490 1 |a Max Planck series on Asian intellectual property law 
500 |a "Max Planck Institute for Innovation and Competition" 
504 |a Includes bibliographical references 
505 0 |a Introduction / Peter Ganea & Danny Friedmann -- Patents, utility models and designs / Peter Ganea -- Trade marks and related rights / Danny Friedmann -- Copyright / Peter Ganea -- Unfair competition and antitrust law / Jyh-An Lee -- Technology transfer / Jyh-An Lee -- Enforcement / Douglas Clark 
588 0 |a Online resource; title from cover image (publisher's website, viewed April 13, 2021) 
651 7 |a China.  |2 fast  |0 (OCoLC)fst01206073  |9 279826 
653 0 |a Intellectual property  |z China. 
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700 1 |a Lee, Jyh-An,  |9 909739 
700 1 |a Clark, Douglas  |c (Lawyer),  |9 909740 
700 1 |a Heath, Christopher,  |9 909563 
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