Dislocation filter based on LT-GaAs layers for monolithic GaAs/Si integration

The use of low-temperature (LT) GaAs layers as dislocation filters in GaAs/Si heterostructures (HSs) was investigated in this study. The effects of intermediate LT-GaAs layers and of the post-growth and cyclic in situ annealing on the structural properties of GaAs/LT-GaAs/GaAs/Si(001) HSs were studi...

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Published in:Nanomaterials Vol. 12, № 24. P. 4449 (1-19)
Other Authors: Petrushkov, Mikhail O., Abramkin, Demid S., Emelyanov, Eugeny A., Putyato, Mikhail A., Komkov, Oleg S., Firsov, Dmitrii D., Vasev, Andrey V., Yesin, Michail Yu, Bakarov, Askhat K., Loshkarev, Ivan D., Gutakovskii, Anton K., Atuchin, Victor V., Preobrazhenskii, Valery V.
Format: Article
Language:English
Subjects:
Online Access:http://vital.lib.tsu.ru/vital/access/manager/Repository/koha:001008910
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245 1 0 |a Dislocation filter based on LT-GaAs layers for monolithic GaAs/Si integration  |c M. O. Petrushkov, D. S. Abramkin, E. A. Emelyanov [et al.] 
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520 3 |a The use of low-temperature (LT) GaAs layers as dislocation filters in GaAs/Si heterostructures (HSs) was investigated in this study. The effects of intermediate LT-GaAs layers and of the post-growth and cyclic in situ annealing on the structural properties of GaAs/LT-GaAs/GaAs/Si(001) HSs were studied. It was found that the introduction of LT-GaAs layers, in combination with post- growth cyclic annealing, reduced the threading dislocation density down to 5 × 106 cm−2, the root-mean-square roughness of the GaAs surface down to 1.1 nm, and the concentration of non- radiative recombination centers in the near-surface GaAs/Si regions down to the homoepitaxial GaAs level. Possible reasons for the improvement in the quality of near-surface GaAs layers are discussed. On the one hand, the presence of elastic deformations in the GaAs/LT-GaAs system led to dislocation line bending. On the other hand, gallium vacancies, formed in the LT-GaAs layers, diffused into the overlying GaAs layers and led to an increase in the dislocation glide rate. It was demonstrated that the GaAs/Si HSs obtained with these techniques are suitable for growing high-quality light-emitting HSs with self-assembled quantum dots. 
653 |a молекулярно-лучевая эпитаксия 
653 |a самоорганизующиеся квантовые точки 
653 |a низкотемпературный арсенид галлия 
655 4 |a статьи в журналах  |9 897921 
700 1 |a Petrushkov, Mikhail O.  |9 897920 
700 1 |a Abramkin, Demid S.  |9 878565 
700 1 |a Emelyanov, Eugeny A.  |9 897922 
700 1 |a Putyato, Mikhail A.  |9 897923 
700 1 |a Komkov, Oleg S.  |9 897924 
700 1 |a Firsov, Dmitrii D.  |9 897925 
700 1 |a Vasev, Andrey V.  |9 897926 
700 1 |a Yesin, Michail Yu.  |9 496654 
700 1 |a Bakarov, Askhat K.  |9 897927 
700 1 |a Loshkarev, Ivan D.  |9 357109 
700 1 |a Gutakovskii, Anton K.  |9 475092 
700 1 |a Atuchin, Victor V.  |9 95830 
700 1 |a Preobrazhenskii, Valery V.  |9 475087 
773 0 |t Nanomaterials  |d 2022  |g Vol. 12, № 24. P. 4449 (1-19)  |x 2079-4991 
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