Dislocation filter based on LT-GaAs layers for monolithic GaAs/Si integration

The use of low-temperature (LT) GaAs layers as dislocation filters in GaAs/Si heterostructures (HSs) was investigated in this study. The effects of intermediate LT-GaAs layers and of the post-growth and cyclic in situ annealing on the structural properties of GaAs/LT-GaAs/GaAs/Si(001) HSs were studi...

Full description

Bibliographic Details
Published in:Nanomaterials Vol. 12, № 24. P. 4449 (1-19)
Other Authors: Petrushkov, Mikhail O., Abramkin, Demid S., Emelyanov, Eugeny A., Putyato, Mikhail A., Komkov, Oleg S., Firsov, Dmitrii D., Vasev, Andrey V., Yesin, Michail Yu, Bakarov, Askhat K., Loshkarev, Ivan D., Gutakovskii, Anton K., Atuchin, Victor V., Preobrazhenskii, Valery V.
Format: Article
Language:English
Subjects:
Online Access:http://vital.lib.tsu.ru/vital/access/manager/Repository/koha:001008910
LEADER 02717nab a2200421 c 4500
001 koha001008910
005 20231103132025.0
007 cr |
008 231030|2022 sz s a eng d
024 7 |a 10.3390/nano12244449  |2 doi 
035 |a koha001008910 
040 |a RU-ToGU  |b rus  |c RU-ToGU 
245 1 0 |a Dislocation filter based on LT-GaAs layers for monolithic GaAs/Si integration  |c M. O. Petrushkov, D. S. Abramkin, E. A. Emelyanov [et al.] 
336 |a Текст 
337 |a электронный 
520 3 |a The use of low-temperature (LT) GaAs layers as dislocation filters in GaAs/Si heterostructures (HSs) was investigated in this study. The effects of intermediate LT-GaAs layers and of the post-growth and cyclic in situ annealing on the structural properties of GaAs/LT-GaAs/GaAs/Si(001) HSs were studied. It was found that the introduction of LT-GaAs layers, in combination with post- growth cyclic annealing, reduced the threading dislocation density down to 5 × 106 cm−2, the root-mean-square roughness of the GaAs surface down to 1.1 nm, and the concentration of non- radiative recombination centers in the near-surface GaAs/Si regions down to the homoepitaxial GaAs level. Possible reasons for the improvement in the quality of near-surface GaAs layers are discussed. On the one hand, the presence of elastic deformations in the GaAs/LT-GaAs system led to dislocation line bending. On the other hand, gallium vacancies, formed in the LT-GaAs layers, diffused into the overlying GaAs layers and led to an increase in the dislocation glide rate. It was demonstrated that the GaAs/Si HSs obtained with these techniques are suitable for growing high-quality light-emitting HSs with self-assembled quantum dots. 
653 |a молекулярно-лучевая эпитаксия 
653 |a самоорганизующиеся квантовые точки 
653 |a низкотемпературный арсенид галлия 
655 4 |a статьи в журналах 
700 1 |a Petrushkov, Mikhail O. 
700 1 |a Abramkin, Demid S. 
700 1 |a Emelyanov, Eugeny A. 
700 1 |a Putyato, Mikhail A. 
700 1 |a Komkov, Oleg S. 
700 1 |a Firsov, Dmitrii D. 
700 1 |a Vasev, Andrey V. 
700 1 |a Yesin, Michail Yu. 
700 1 |a Bakarov, Askhat K. 
700 1 |a Loshkarev, Ivan D. 
700 1 |a Gutakovskii, Anton K. 
700 1 |a Atuchin, Victor V. 
700 1 |a Preobrazhenskii, Valery V. 
773 0 |t Nanomaterials  |d 2022  |g Vol. 12, № 24. P. 4449 (1-19)  |x 2079-4991 
852 4 |a RU-ToGU 
856 4 |u http://vital.lib.tsu.ru/vital/access/manager/Repository/koha:001008910 
908 |a статья 
999 |c 1008910  |d 1008910