Low-resistivity gas sensors based on the In2O3-Ga2O3 mixed compounds films

The effect of H2, NH3, CO, CH4, O2 and NO2 on the electroconductive properties of the In2O3-Ga2O3 mixed compounds films obtained by the halide vapor phase epitaxy was studied. In the temperature range of 150–550 °C In2O3-Ga2O3 films are characterized by high responses, high speed of operation when e...

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Published in:Materials today communications Vol. 34. P. 105241 (1-10)
Other Authors: Yakovlev, Nikita N., Almaev, Aleksei V., Nikolaev, Vladimir I., Kushnarev, Bogdan O., Pechnikov, Aleksei I., Stepanov, Sergey I., Chikiryaka, Andrei V., Timashov, R. B., Scheglov, Mikhail P., Butenko, Pavel N., Almaev, Dmitry A., Chernikov, Evgeniy V.
Format: Article
Language:English
Subjects:
Online Access:http://vital.lib.tsu.ru/vital/access/manager/Repository/koha:001016315
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245 1 0 |a Low-resistivity gas sensors based on the In2O3-Ga2O3 mixed compounds films  |c N. N. Yakovlev, A. V. Almaev, V. I. Nikolaev [et al.] 
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520 3 |a The effect of H2, NH3, CO, CH4, O2 and NO2 on the electroconductive properties of the In2O3-Ga2O3 mixed compounds films obtained by the halide vapor phase epitaxy was studied. In the temperature range of 150–550 °C In2O3-Ga2O3 films are characterized by high responses, high speed of operation when exposed to H2, NH3, CO and O2. A qualitative mechanism of gas sensitivity for the In2O3-Ga2O3 mixed compounds films to gases was proposed. The gas-sensitive characteristics of In2O3, κ(ε)-Ga2O3 and In2O3-Ga2O3 films were compared. The advantage of the In2O3-Ga2O3 mixed compounds films compared with Ga2O3 and In2O3 films is a low base electrical resistivity with a relatively high gas sensitivity. 
653 |a газовые сенсоры 
653 |a электрические свойства 
653 |a низкое сопротивление 
653 |a оксиды металлов 
653 |a пленки 
655 4 |a статьи в журналах 
700 1 |a Yakovlev, Nikita N. 
700 1 |a Almaev, Aleksei V. 
700 1 |a Nikolaev, Vladimir I. 
700 1 |a Kushnarev, Bogdan O. 
700 1 |a Pechnikov, Aleksei I. 
700 1 |a Stepanov, Sergey I. 
700 1 |a Chikiryaka, Andrei V. 
700 1 |a Timashov, R. B. 
700 1 |a Scheglov, Mikhail P. 
700 1 |a Butenko, Pavel N. 
700 1 |a Almaev, Dmitry A. 
700 1 |a Chernikov, Evgeniy V. 
773 0 |t Materials today communications  |d 2023  |g Vol. 34. P. 105241 (1-10)  |x 2352-4928 
852 4 |a RU-ToGU 
856 4 |u http://vital.lib.tsu.ru/vital/access/manager/Repository/koha:001016315 
908 |a статья 
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