Adhesion at TiNi interfaces with Ta, Mo and Si

Atomic and electronic structure of (001) and (110) interfaces between TiNi and Ta, Mo, Si thin films are investigated by ab-initio method within density functional theory. It is shown that high adhesion properties can be attained at the Mo/TiNi(001)Ti interface, whereas the work of separation of Ta...

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Bibliographic Details
Published in:MATEC Web of conferences Vol. 33. P. 03006-1-03006-6
Corporate Author: Томский государственный университет Физический факультет Научные подразделения ФФ
Other Authors: Bakulin, Alexander V., Meisner, Lyudmila L., Kulkova, Svetlana E., Tarasov, Konstantin Yu
Format: Article
Language:English
Subjects:
Online Access:http://vital.lib.tsu.ru/vital/access/manager/Repository/vtls:000537535
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