Effect of vacuum conditions and plasma concentration on the chemical composition and adhesion of vacuum-plasma coatings

The paper reports on the chemical composition of titanium nitride (TiN) and silicon (Si) coatings deposited with a new technological vacuum plasma setup which comprises magnetron sputtering systems, arc evaporators, and an efficient plasma generator. It is shown that due to highly clean vacuum condi...

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Bibliographic Details

Published in:	Journal of Physics: Conference Series Vol. 652. P. 012020 (1-5)
Main Author:	Borisov, Dmitry P.
Other Authors:	Kuznetsov, Vladimir M. физик, Slabodchikov, V. A.
Format:	Article
Language:	English
Subjects:	вакуум плазма адгезия покрытие нитридом титана вакуумно-плазменные установки статьи в журналах
Online Access:	http://vital.lib.tsu.ru/vital/access/manager/Repository/vtls:000577935 Перейти в каталог НБ ТГУ