Effect of vacuum conditions and plasma concentration on the chemical composition and adhesion of vacuum-plasma coatings
The paper reports on the chemical composition of titanium nitride (TiN) and silicon (Si) coatings deposited with a new technological vacuum plasma setup which comprises magnetron sputtering systems, arc evaporators, and an efficient plasma generator. It is shown that due to highly clean vacuum condi...
| Published in: | Journal of Physics: Conference Series Vol. 652. P. 012020 (1-5) |
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| Main Author: | |
| Other Authors: | , |
| Format: | Article |
| Language: | English |
| Subjects: | |
| Online Access: | http://vital.lib.tsu.ru/vital/access/manager/Repository/vtls:000577935 Перейти в каталог НБ ТГУ |