Formation of dislocations in the process of impurity diffusion in GaAs

A study of the formation of dislocations in the process of impurity diffusion in GaAs has been carried out. The formation of dislocations in GaAs diffusion layers doped with various impurities (elements of II, IV, and VI groups and transition elements) is studied, depending on the conditions of diff...

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Bibliographic Details
Published in:Russian physics journal Vol. 64, № 12. P. 2350-2356
Other Authors: Khludkov, Stanislav S., Prudaev, Ilya A., Tolbanov, Oleg P., Ivonin, Ivan V.
Format: Article
Language:English
Subjects:
Online Access:http://vital.lib.tsu.ru/vital/access/manager/Repository/koha:000997193
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LEADER 02351nab a2200361 c 4500
001 koha000997193
005 20230320020504.0
007 cr |
008 230221|2022 ru s a eng d
024 7 |a 10.1007/s11182-022-02596-3  |2 doi 
035 |a koha000997193 
040 |a RU-ToGU  |b rus  |c RU-ToGU 
245 1 0 |a Formation of dislocations in the process of impurity diffusion in GaAs  |c S. S. Khludkov, I. A. Prudaev, O. P. Tolbanov, I. V. Ivonin 
336 |a Текст 
337 |a электронный 
504 |a Библиогр.: 19 назв. 
520 3 |a A study of the formation of dislocations in the process of impurity diffusion in GaAs has been carried out. The formation of dislocations in GaAs diffusion layers doped with various impurities (elements of II, IV, and VI groups and transition elements) is studied, depending on the conditions of diffusion. It is shown that during the diffusion of impurities in GaAs, in the diffusion layers, dislocations are formed, the density of which in the layers doped to the limiting surface concentrations can reach 108 cm-2. As the surface concentration of the diffusing impurity decreases, the dislocation density decreases. The diffusion conditions are determined, under which no additional dislocations are formed. Based on a comparison of the obtained experimental data and the results of the performed calculation, it was concluded that the formation of dislocations during the diffusion of impurities in GaAs is due to the gradient of the impurity concentration. 
653 |a арсенид галлия 
653 |a диффузия 
653 |a механические напряжения 
653 |a дислокационное образование 
655 4 |a статьи в журналах  |9 879358 
700 1 |a Khludkov, Stanislav S.  |9 439488 
700 1 |a Prudaev, Ilya A.  |9 99979 
700 1 |a Tolbanov, Oleg P.  |9 95834 
700 1 |a Ivonin, Ivan V.  |9 208660 
773 0 |t Russian physics journal  |d 2022  |g Vol. 64, № 12. P. 2350-2356  |x 1064-8887 
852 4 |a RU-ToGU 
856 4 |u http://vital.lib.tsu.ru/vital/access/manager/Repository/koha:000997193 
856 |y Перейти в каталог НБ ТГУ  |u https://koha.lib.tsu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=997193 
908 |a статья 
039
999 |c 997193  |d 997193