Gas sensitivity of IBSD deposited TiO2 thin films

Gas sensitivity of IBSD deposited TiO2 thin films

TiO2 films of 130 nm and 463 nm in thickness were deposited by ion beam sputter deposition (IBSD), followed by annealing at temperatures of 800 °C and 1000 °C. The effect of H2, CO, CO2, NO2, NO, CH4 and O2 on the electrically conductive properties of annealed TiO2 thin films in the operating temper...

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Bibliographic Details
Published in:Coatings Vol. 12, № 10. P. 1565 (1-17)
Other Authors: Almaev, Aleksei V., Yakovlev, Nikita N., Kushnarev, Bogdan O., Kopyev, Viktor V., Novikov, Vadim A., Zinoviev, Mikhail M., Yudin, Nikolay N., Podzyvalov, Sergey N., Erzakova, Nadezhda N., Chikiryaka, Andrei V., Shcheglov, Mikhail P., Baalbaki, Houssain A., Olshukov, Alexey S.
Format: Article
Language:English
Subjects:
ионно-лучевое распыление
оксид титана
тонкие пленки
осаждение
статьи в журналах
Online Access:http://vital.lib.tsu.ru/vital/access/manager/Repository/koha:000997770
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http://vital.lib.tsu.ru/vital/access/manager/Repository/koha:000997770
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