Nano‑scale structural studies of defects in arsenic‑implanted n and p‑type HgCdTe films

Bright-feld and high-resolution transmission electron microscopy were used for nano-scale structural studies of defects induced by implantation of arsenic ions with 190 keV energy and 1014 cm-2 fuence in n and p-type Hg0.78Cd0.22Te flms grown by molecular-beam epitaxy. A similarity in defect pattern...

Full description

Bibliographic Details
Published in:Applied nanoscience Vol. 12, № 3. P. 395-401
Other Authors: Izhnin, Igor I., Voytsekhovskiy, Alexander V., Korotaev, Alexander G., Mynbaev, Karim D., Świątek, Zbigniew, Morgiel, Jerzy, Fitsych, Olena I., Varavin, Vasilii S., Marin, Denis V., Yakushev, Maxim V., Bonchyk, A. Yu, Savytskyy, Hrygory V.
Format: Article
Language:English
Subjects:
Online Access:http://vital.lib.tsu.ru/vital/access/manager/Repository/koha:000927183
Перейти в каталог НБ ТГУ
Description
Summary:Bright-feld and high-resolution transmission electron microscopy were used for nano-scale structural studies of defects induced by implantation of arsenic ions with 190 keV energy and 1014 cm-2 fuence in n and p-type Hg0.78Cd0.22Te flms grown by molecular-beam epitaxy. A similarity in defect pattern formed by arsenic implantation in n and p-type material was observed. The electrical properties of the implanted layers in n and p-type flms also appeared to be similar, confrming the results of microscopic observations.
Bibliography:Библиогр.: с. 401
ISSN:2190-5509