Analysis of carrier species in arsenic-implanted p- and n-type Hg0.7Cd0.3Te

Carrier species in arsenic-implanted p- and n-type Hg0.7Cd0.3Te films grown by molecular-beam epitaxy were investigated with the use of the Hall-effect studies and mobility spectrum analysis. The implantation was performed with ion energy 190 or 350 keV and ion fluence ranging from 1012 to 1015 cm2....

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Published in:Infrared physics and technology Vol. 114. P. 103665 (1-7)
Other Authors: Izhnin, Igor I., Mynbaev, Karim D., Voytsekhovskiy, Alexander V., Korotaev, Alexander G., Varavin, Vasilii S., Dvoretsky, Sergei A., Mikhailov, Nikolay N., Yakushev, Maxim V., Fitsych, Olena I., Świątek, Zbigniew
Format: Article
Language:English
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Online Access:http://vital.lib.tsu.ru/vital/access/manager/Repository/koha:000901902
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245 1 0 |a Analysis of carrier species in arsenic-implanted p- and n-type Hg0.7Cd0.3Te  |c I. I. Izhnin, K. D. Mynbaev, A. V. Voitsekhovskii [et al.] 
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504 |a Библиогр.: 18 назв. 
520 3 |a Carrier species in arsenic-implanted p- and n-type Hg0.7Cd0.3Te films grown by molecular-beam epitaxy were investigated with the use of the Hall-effect studies and mobility spectrum analysis. The implantation was performed with ion energy 190 or 350 keV and ion fluence ranging from 1012 to 1015 cm2. A substantial difference between carrier species in Hg0.7Cd0.3Te and Hg0.8Cd0.2Te films subjected to arsenic implantation and post- implantation activation annealing was established. In particular, arsenic implantation in p-type Hg0.7Cd0.3Te in most cases lead to the formation of n+-p- (not n+-n-p-) structures, and in n-type Hg0.7Cd0.3Te films post- implantation activation annealing lead to modification of the electrical parameters of the n-type 'base', in contrast to Hg0.8Cd0.2Te material studied earlier. The difference in carrier species formed in arsenic-implanted Hg0.7Cd0.3Te and Hg0.8Cd0.2Te films was tentatively explained by different background impurity concentrations in the films with different chemical composition. 
653 |a имплантация мышьяка 
653 |a ионная имплантация 
653 |a молекулярно-лучевая эпитаксия 
653 |a эпитаксиальные пленки 
655 4 |a статьи в журналах  |9 879358 
700 1 |a Izhnin, Igor I.  |9 102905 
700 1 |a Mynbaev, Karim D.  |9 111823 
700 1 |a Voytsekhovskiy, Alexander V.  |9 91706 
700 1 |a Korotaev, Alexander G.  |9 106335 
700 1 |a Varavin, Vasilii S.  |9 102908 
700 1 |a Dvoretsky, Sergei A.  |9 101527 
700 1 |a Mikhailov, Nikolay N.  |9 103757 
700 1 |a Yakushev, Maxim V.  |9 102909 
700 1 |a Fitsych, Olena I.  |9 102906 
700 1 |a Świątek, Zbigniew  |9 264267 
700 1 |a Izhnin, Igor I.  |9 102905 
773 0 |t Infrared physics and technology  |d 2021  |g Vol. 114. P. 103665 (1-7)  |x 1350-4495 
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